High Power Impluse Magenetron Sputtering (HiPIMS) is featured by high ionization rate, high adhesion between film and substrate and so on. However, the coating deposition rate is relatively low, which restricts widely industrial applications. To solve the shortcoming of the low deposition rate of traditional HiPIMS, our laboratory has successfully developed Hybrid Pulse HIPIMS power supply, which combine a pre-ignition pulse and a low-voltage work pulse. The pre-ignition pulse can excite high density plasma, and the work pulse can significantly reduce the effect of target re-attracting ions due to the utilization of low voltage. By using Hybrid Pulse HIPIMS power, we tested on Cr target in the vacuum chamber to study the influence of different pre-ignition pulse, work pulse on the discharge characteristics. CrN films have been fabricated to study the effect of different pre-ignition pulse and work pulse on microstructure and properties. The results show that I*t in every pulse on the substrate 7.4×10-5C for novel HiPIMS and 4.6×10-5C for conventional HiPIMS at the same substrate bias, at the same HiPIMS power. The n mber of ions bombarding the substrate remarkably increases. At constant power, the Ar (1+) ion quantity in Hybrid Pulse HIPIMS mode increases by 3 times compared with conventional HIPIMS. The deposition rate of Hybrid Pulse HIPIMS also increases 3 times compared to the traditional HIPIMS. The n mber of ions bombarding the substrate decreases from 14×10-5C to 12×10-5C with increasing pulse width of work pulse.