论文部分内容阅读
Studies on the mixed vanadium oxide thin film deposited by RF magnetron sputtering and its applicati
【机 构】
：
Lanzhou Institute of Physics,Lanzhou 730000,China
【出 处】
：
第四届国际表面与界面科学与工程学术会议(The Fourth International Conference on S
【发表日期】
：
2009年12期
其他文献
Surface passivation is one of the key factors to the high efficiency solar cells.In this paper (Al2O3)x(TiO2)1-x dielectric films used as backside surface passivation for crystalline silicon solar cel
Gettering process is commonly used to increase the minority carrier lifetime of silicon wafers and thus the conversion efficiencies of the solar cells fabricated on the wafers.In this paper,the effect
会议
The Al-AlN granular films with different resistivity were deposited for serving as the Surface-conduction Electron-emission Display (SED) cathode materials and the effect of the different resistivity
会议
High density of Sn quantum dots (QDs) have been grown epitaxially on Si(001) substrate by solid phase epitaxy (SPE).The dependences of morphology and crystallinity of Sn QDs on the Sn coverage,anneali
p-type ZnO thin films were prepared by thermal oxidation of rf magnetron sputtered Zn3N2∶Al films on glass substrates.The effects of oxidation temperature on the structural,optical and electrical prop
Anedic titanium oxidization (ATO) is a relatively simple technique that can be easily automated for preparing TiO2 nanotube arrays with high specific surface area.In the present work,we demonstrate th
Ti-W-N thin films were deposited by reactive RF sputtering with a W-Ti(30 at.%) target in an argon/nitrogen atmosphere.The nitrogen partial pressure ratio in the growth chamber was varied from 0 to 11
Porous anodic aluminum oxide (AAO) films were fabricated electrochemically in different preparation conditions such as in the mixed electrolytes with various volume ratios of 0.3M C2H2O4 and 0.3M H2SO
会议