利用紫外光改善銅箔化學氣相沉積法生成之石墨烯的轉移方法

来源 :2015台湾物理年会 | 被引量 : 0次 | 上传用户：rzptxjgl

【摘要】

：

　　藉由化學氣相沉積法在銅箔上生成石墨烯的方法已經被廣泛的採用,為了應用在電子元件製作上,將石墨烯從銅箔上轉移至絕緣基板是有其必要性的。過去常見的轉移方法有熱裂解

【作者】

：

張明凱林宏一

【机构】

：

材料科學系,台南大學,台南,Taiwan

【出处】

：

2015台湾物理年会

【发表日期】

：

2015年1期

【关键词】

：

石墨烯濕式轉移法化學氣相沉積法銅箔

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　　藉由化學氣相沉積法在銅箔上生成石墨烯的方法已經被廣泛的採用,為了應用在電子元件製作上,將石墨烯從銅箔上轉移至絕緣基板是有其必要性的。過去常見的轉移方法有熱裂解膠帶轉移法、使用聚甲基丙烯酸甲酯(poly(methylmethacrylate),PMMA)的濕式轉移法等,卻有殘留物去除不完全的問題,因而影響石墨烯的光電性質。

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利用紫外光改善銅箔化學氣相沉積法生成之石墨烯的轉移方法

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