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5. Investigation on the thin films on aluminum surface deposited by CF4/Ar and CF4 /O2/Ar plasmas by us

Investigation on the thin films on aluminum surface deposited by CF4/Ar and CF4 /O2/Ar plasmas by us

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户：radcuijun

【摘 要】

：

The temporally resolved optical emission spectroscopy (OES) is measured in capacitively coupled CF4/Ar or CF4/O2/Ar plasmas after CF4 or CF4/O2 is cut off.

【作 者】

：

Jiang Li Xi-Ming Zhu Yi-Kang Pu 

【机 构】

：

Department of Engineering Physics, Tsinghua University, Beijing 100084, China

【出 处】

：

2011年第三届微电子及等离子体技术国际会议

【发表日期】

：

2011年9期

【关键词】

：

optical emission spectroscopy capacitively coupled plasma thin film 

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The temporally resolved optical emission spectroscopy (OES) is measured in capacitively coupled CF4/Ar or CF4/O2/Ar plasmas after CF4 or CF4/O2 is cut off.

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