Tight-binding quantum chemical molecular dynamics approach to elucidating the effects of etchant com

来源 :The 15th ICQC International Congress of Quantum Chemistry(第1 | 被引量 : 0次 | 上传用户：wanglyyou66

【摘要】

：

In the fabrication process of MEMS and semiconductor devices,plasma etching is widely employed to proceed a miniaturization of the structures.

【作者】

：

H.Ito T.Kuwahara Y.Higuchi N.Ozawa M.Kubo

【机构】

：

Institute for Materials Research,Tohoku University,Japan

【出处】

：

The 15th ICQC International Congress of Quantum Chemistry(第1

【发表日期】

：

2015年5期

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In the fabrication process of MEMS and semiconductor devices,plasma etching is widely employed to proceed a miniaturization of the structures.

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Tight-binding quantum chemical molecular dynamics approach to elucidating the effects of etchant com

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