Si3N4/CrN nanostructured multilayers grown by RF reactive magnetron sputtering

来源 :Transactions of Nonferrous Metals Society of China | 被引量 : 0次 | 上传用户:winchard
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The amorphous/polycrystalline Si_3N_4/CrN nano-structured multilayer films ha ve been prepared by radio frequency (RF) reactive magnetron sputtering. The comp osition,microstructure and mechanical properties of these films were characteri zed by X-ray photoelectron spectroscopy (XPS),X-ray diffraction (XRD),high- resolution transmission electron microscopy (HRTEM) and nano-indentation. The C rN and (Si_3N_4) single layer films are polycrystalline face centered-cubic and amorphous structures,respectively. The CrN and Si_3N_4 layers are nearly stoichiometric. The HRTEM image indicates that the interfaces are planar and m odulation structure is clear in multilayers. The hardness values of Si_3N_4/Cr N multilayers are between those of the constituent CrN and Si_3N_4 films at a substrate temperature of 20 ℃,and are somewhat higher than those of Si_3N_4 films at a deposition temperature of 500 ℃. There is no superhardness effect in the Si_3N_4/CrN multilayers. Based on the experimental results,the hardeni ng mechanisms in the multilayers have been discussed. The amorphous / polycrystalline Si_3N_4 / CrN nano-structured multilayer films have been prepared by radio frequency (RF) reactive magnetron sputtering. The composition, microstructure and mechanical properties of these films were characteri zed by X-ray photoelectron spectroscopy (XPS) X-ray diffraction (XRD), high resolution transmission electron microscopy (HRTEM) and nano-indentation. The C rN and (Si_3N_4) single layer films are polycrystalline face centered- cubic and amorphous structures, respectively. The CrN and Si_3N_4 layers are Near stoichiometric. The HRTEM image indicates that the interfaces are planar and the modulation structure is clear in multilayers. The hardness values ​​of Si_3N_4 / Cr N multilayers are among those composed of CrN and Si_3N_4 films at a substrate temperature of 20 ° C, and are somewhat higher than those of Si_3N_4 films at a deposition temperature of 500 ° C. There is no superhardness effect in Si_3N_4 / CrN multilayers. Based on the experimental r esults, the hardeni ng mechanisms in the multilayers have been discussed.
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