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本文介绍国外用在反应离子束蚀刻机上的磁控管离子源的原理,设计方法和性能。还介绍了采用这种源进行的蚀刻结果。
This paper introduces the principle, design method and performance of magnetron ion source used in reactive ion beam etching machine abroad. The results of etching using this source are also described.