Microstructure of ternary Zn1-xCdxO films on silicon substrate

来源 :Transactions of Nonferrous Metals Society of China | 被引量 : 0次 | 上传用户：wjh_1201

【摘要】

：

Ternary Zn1-xCdx O alloying films were deposited on silicon substrates by a reactive magnetron sputtering method.The structures of the films were characterized

【作者】

：

卢焕明叶志镇马德伟黄靖云朱丽萍赵炳辉

【机构】

：

StateKeyLaboratoryofSiliconMaterials

【出处】

：

Transactions of Nonferrous Metals Society of China

【发表日期】

：

2005年1期

【关键词】

：

钆氧化锌合金微观结构反应溅射法硅基薄膜半导体 ZnCdO microstructure sputtering

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Ternary Zn1-xCdx O alloying films were deposited on silicon substrates by a reactive magnetron sputtering method.The structures of the films were characterized by transmission electron microscopy(TEM) and X-ray diffraction (XRD) analysis, respectively. Th

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Microstructure of ternary Zn1-xCdxO films on silicon substrate

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