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本文介绍了 JGP- 4 2 0型超高真空射频磁控溅射镀膜机的设计思想和研制过程 ,并讨论了在该机上进行硅片上沉积 Pt和 Si O2 膜层的实验情况。此文仅为此类机器及其工艺的发展提供一定的借鉴
This article introduces the design idea and development process of JGP-420 ultra-high vacuum RF Magnetron Sputtering Coater and discusses the experiment of depositing Pt and Si O2 film on the wafer on this machine. This article only for the development of such machinery and its process to provide some reference