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通过热丝化学气相沉积(HFCVD)技术,在钽衬底上制备了p型掺硼金刚石(BDD)薄膜电极。利用原子力显微镜(AFM)分析丙酮体积分数对BDD电极的表面形貌和成膜质量的影响,利用循环伏安法(CV)分析BDD电极在不同种类、不同浓度电解液中的电化学特性。结果表明,当丙酮体积分数为1.5%时,金刚石薄膜表现出优异的附着力,并且BDD电极具有稳定的电化学特性。采用制备的BDD电极,在不同浓度的KCl和KH2PO4电解液中使用,得出电势窗口均在3.4 V以上。
A p-type boron doped diamond (BDD) thin film electrode was fabricated on a tantalum substrate by hot filament chemical vapor deposition (HFCVD). The effects of acetone volume fraction on the surface morphology and film quality of BDD electrode were analyzed by atomic force microscopy (AFM). The electrochemical properties of BDD electrode in different electrolyte concentrations were analyzed by cyclic voltammetry (CV). The results showed that the diamond films showed excellent adhesion when the volume fraction of acetone was 1.5%, and the BDD electrodes had stable electrochemical properties. The prepared BDD electrode was used in different concentrations of KCl and KH2PO4 electrolyte, and the potential window was above 3.4V.