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光刻空间像仿真作为各种计算光刻技术的基础,受到越来越多的重视。提出一种基于互强度傅里叶分析的光刻机投影成像快速模拟方法,从光刻成像互强度传播过程入手,基于傅里叶光学原理对成像要素进行多次空域-频域变换,得到一种快捷的空间像模拟途径。通过与标准解析空间像对比,发现该方法的计算精度可达10-4(最大光强归一化)。该方法避免了部分相干成像的Hopkins方程中繁琐的积分运算,操作性强、计算精度高。该方法适用于各种灵活多变的曝光成像条件,具备广阔的工程应用前景。
Photolithography space simulation as the basis for a variety of computing lithography, more and more attention. A rapid simulation method of lithography projection based on mutual intensity Fourier analysis was proposed. Starting from the mutual intensity propagation of lithography, Fourier transform was used to transform the imaging elements multiple times from airspace to frequency domain, A quick way to simulate space. Compared with the standard analytic space image, it is found that the method can achieve the accuracy of 10-4 (maximum intensity normalization). The method avoids the cumbersome integral operation in Hopkins equation of partially coherent imaging, and has high operability and high computational accuracy. The method is suitable for a variety of flexible imaging conditions, has a broad prospect of engineering applications.