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在磷酸盐体系下,采用恒压模式对氢化锆(Zr H1.8)进行微弧氧化。考察了电源频率对氧化膜的厚度、相结构、截面形貌以及阻氢性能的影响。利用扫描电镜(SEM)、X射线衍射(XRD)、膜层测厚仪分析了氧化膜的表面形貌、截面形貌、相结构及膜层厚度。通过真空脱氢实验评估膜层的阻氢性能。结果表明:随着电源频率的增加,Zr H1.8表面微弧氧化膜层厚度由约50μm仅减小至约45μm;电源频率的增加能有效提高膜层的致密性;电源频率的改变对于膜层的相结构没有明显影响,膜层主要由单斜相氧化锆(M-Zr O2)和四方相氧化锆(T-Zr O1.88)构成,其中单斜相占80%以上;电源频率的增加有助于提高氧化膜的阻氢效果,当电源频率增加到300 Hz时,氧化膜的氢渗透降低因子PRF值高达10.8。
In the phosphate system, zirconium hydride (Zr H1.8) was micro-arc oxidized by a constant pressure mode. The effect of power frequency on the thickness, phase structure, cross-sectional morphology and hydrogen-occluding properties of the oxide film was investigated. The surface morphology, cross-sectional morphology, phase structure and film thickness of the oxide film were analyzed by scanning electron microscopy (SEM), X-ray diffraction (XRD) and thickness gauge. The hydrogen barrier properties of the film were evaluated by vacuum dehydrogenation experiments. The results show that with the increase of the power frequency, the thickness of the micro-arc oxidation coating on the surface of Zr H1.8 is reduced from about 50μm to about 45μm. The increase of the power frequency can effectively improve the compactness of the film. The phase structure of the layer has no obvious effect, the film mainly consists of monoclinic zirconia (M-ZrO2) and tetragonal phase zirconia (T-ZrO1.88), of which monoclinic phase accounts for more than 80%; power frequency Increasing helps to improve the hydrogen barrier effect of the oxide film. When the frequency of the power supply is increased to 300 Hz, the PRF value of the hydrogen permeation reduction factor of the oxide film is as high as 10.8.