Up-scaled deposition process of Teer-UDP850/4 has been established and used for massive production of CrTiAIN hard coatings in applications of anti-wear, cutting and forming tools. This deposition system uses four magnetrons that are arranged by unbalanced magnets to form closed magnetic field enabling the system running in high current density. Elemental metals of Cr, Ti and Al are used as the target materials which are co-deposited with nitrogen forming multialloy nitride, nanoscale multi-layer or superlattice hard coatings. The substrate turntable is desfgned as planet rotation mechanism with three folds so that components or tools with complicate geometry can be uniformly coated onto all their surfaces and cutting edges. The power units for the magnetrons are straight dc whilst the substrate is biased by pulsed dc. Two solid heaters are installed in the system to enable running a wide range of deposition temperature from 200°C to 500°C. The pumping system is powerful that incorporated with a polycold to pump the system to a good vacuum in a very short time. A front door and a movable substrate table are available to benefit easily loading and unloading. Deposition procedure, properties and performance of the coatings is also presented in this paper. Up-scaled deposition process of Teer-UDP850 / 4 has been established and used for massive production of CrTiAIN hard coatings in applications of anti-wear, cutting and forming tools. This deposition system uses four magnetrons that are arranged by unbalanced magnets to form closed magnetic field enabling the system running in high current density. Elemental metals of Cr, Ti and Al are used as the target materials which are co-deposited with nitrogen forming multialloy nitride, nanoscale multi-layer or superlattice hard coatings. The substrate turntable is desfgned as planet rotation mechanism with three folds so that components or tools with complicate geometry can be uniformly coated onto all their surfaces and cutting edges. The power units for the magnetrons are straight dc whilst the substrate is biased by pulsed dc. Two solid heaters are installed in the system to enable a wide range of deposition temperature from 200 ° C to 500 ° C. The pumping system is powerful that incorpo rated with a polycold to pump the system to a good vacuum in a very short time. A front door and a movable substrate table are available to benefit easily loading and unloading. Deposition procedure, properties and performance of the coatings is also presented in this paper .