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薄膜工艺是集成电路中的关键工艺之一,各种膜的质量直接影响集成电路的功能和成品率。通过薄膜组分、结构、纯度及各项物性的检定以评价薄膜质量的优劣。本文主要介绍几种理化仪器分析的评价方法。1.二次离子质谱(SIMS)方法二次离子质谱可用于分析薄膜表面及深度中的微最杂质。用一定能量的一次离子束轰击样品,样品表面的物质以正负离子、中性原子和分子等形式被溅射出来,溅射出来的离子进入电离室,通过特定电压的静电加速系统,被加速的离子进入磁感应强度为B 的均匀磁场中,离子在磁场中受到偏转力或向心力的作用,受
Thin film technology is one of the key processes in integrated circuits. The quality of various films directly affects the function and yield of integrated circuits. Through the film composition, structure, purity and physical properties of the test to evaluate the pros and cons of film quality. This article describes several methods of evaluation of physical and chemical instrumentation. 1. Secondary ion mass spectrometry (SIMS) method Secondary ion mass spectrometry can be used to analyze the micro-thinner surface and depth of the most impurity. The sample is bombarded with a primary ion beam of a certain energy. The material on the sample surface is sputtered in the form of positive and negative ions, neutral atoms and molecules. The sputtered ions enter the ionization chamber and are accelerated by a voltage-specific electrostatic acceleration system Ions into the magnetic flux density B uniform magnetic field, the ion in the magnetic field by the deflection force or centripetal force, by