建立了一台微波等离子体化学气相沉积金刚石薄膜的设备。该实验装置由以下几部分组成：微波源及传输系统、反应室、供气系统、真空系统和检测等五部分组成。沉积室是由长７０ｍｍ直径４６ｍｍ的石英管组成的。分别采用ＣＨ４／Ｈ２和ＣＯ／Ｈ２混合气体进行了沉积试验；研究了沉积参数对沉积金刚石膜的影响。在直径３０ｍｍ的单晶硅片和石英片上沉积出了均匀的金刚石膜。采用ＣＨ４／Ｃ２混合气体时，沉积速率在０．５～１．０μｍ／ｈ之间，这与原有的热灯丝方法相近。采用ＣＯ／Ｈ２混合气体时，沉积速率可达到１．７μｍ／ｈ。 A microwave plasma chemical vapor deposition diamond film equipment was established. The experimental device consists of the following parts: microwave source and transmission system, reaction chamber, gas supply system, vacuum system and detection of five parts. The deposition chamber is composed of a quartz tube of 70mm long and 46mm diameter. The deposition experiments were carried out on CH4 / H2 and CO / H2 mixtures respectively. The effects of deposition parameters on the deposition of diamond films were investigated. A uniform diamond film was deposited on the single-crystal silicon wafer and the quartz wafer with a diameter of 30 mm. When using CH4 / C2 mixed gas, the deposition rate is between 0.5 ~ 1.0μm / h, which is similar to the original hot filament method. With CO / H2 mixture, the deposition rate can reach 1.7μm / h.