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本文涉及到在平行板射频等离子体中,气体大于10bar情况下的维持机理。为了考查研究,选择了两个特殊的频率—380kHz和1 3MHz。描述了包括电极电位和等离子体电位随时间变化的等离子体特性。靠近电极表面存在离子鞘层,这个鞘层中的电压降高到足以使电子获得能量产生电离。本文认为由于电极表面的离子轰击而产生的二次电子发射是主要的维持机理。利用产生率等于电荷流量加上复合率的关系,阐述了一个简单的模型。这就预示着外加电压与电流之间的一种线性关系。这种线性关系在低频情况下得到了实验证实。改变电极材料和改变电极间距都得到了与模型相一致的结果。然后介绍了一种在13MHz频率下测量离子电流的新方法。对于实际测到的低密度,要解释其结果,就需要一个附加维持机理,它来源于等离子体的本底产生。
This article deals with the maintenance mechanism in the parallel plate RF plasma where the gas is greater than 10 bar. In order to examine the study, chose two special frequencies -380kHz and 13MHz. Describes the plasma characteristics including electrode potential and plasma potential over time. There is an ion sheath near the surface of the electrode, and the voltage in this sheath is lowered enough to allow the electrons to gain energy to ionize. This paper considers that the secondary electron emission due to the ion bombardment of the electrode surface is the main maintenance mechanism. A simple model is described using the relationship between the generation rate and the charge flow rate and the recombination rate. This indicates a linear relationship between the applied voltage and the current. This linear relationship has been experimentally confirmed at low frequencies. Change the electrode material and change the electrode spacing have been consistent with the model results. Then introduced a new method of measuring ion current at 13MHz frequency. For the actual measured low density, to explain the result, an additional maintenance mechanism is required, which is derived from the background of the plasma.