We present a grating imaging scanning lithography system for the fabrication of large-sized gratings.In this technology,±1-order diffractive beams are generated by a phase grating and selected by a spatial filter.Meanwhile,a 4f system enables the±1-order diffractive beams to form a grating image with a clear jagged-edge boundary on the substrate.A high-precision two-dimensional(2D)mobile stage is used for complementary cyclical scanning,thereby effectively eliminating image stitching errors.The absence of such errors results in a seamless and uniform large-sized grating.Characterized by a simple structure,high energy use,and good stability,this lithography system is highly relevant to the high-speed and costeffective production of large-sized gratings. We present a grating imaging scanning lithography system for the fabrication of large-sized gratings. In this technology, ± 1-order diffractive beams are generated by a phase grating and selected by a spatial filter. Meanwhile, a 4f system enables the ± 1- order diffractive beams to form a grating image with a clear jagged-edge boundary on the substrate. A high-precision two-dimensional (2D) mobile stage is used for complementary cyclical scanning, due to eliminate image stitching errors. absence of such errors results in a seamless and uniform large-sized grating. Characterized by a simple structure, high energy use, and good stability, this lithography system is highly relevant to the high-speed and costeffective production of large-sized gratings.