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利用离子束混合方法在Ｓｍ质量分数为２０％的Ｓｍ－Ｆｅ多层薄膜中，当注入能量为６０ｋｅＶ的Ｎ离子时，成功地制备出Ｓｍ－Ｆｅ－Ｎ磁性薄膜．经透射电镜（ＴＥＭ）和Ｘ射线衍射（ＸＲＤ）分析发现：当Ｎ离子的注入剂量为１×１０１７／ｃｍ２时，形成Ｓｍ２Ｆｅ１７Ｎｘ磁性薄膜；而Ｎ离子的注入剂量为２×１０１７／ｃｍ２时，Ｓｍ－Ｆｅ多层薄膜转变成非晶磁性薄膜，而且Ｓｍ２Ｆｅ１７Ｎｘ磁性薄膜和Ｓｍ－Ｆｅ－Ｎ非晶磁性薄膜的磁性（饱和磁性强度、矫顽力）与注入前的Ｓｍ－Ｆｅ薄膜相比有明显的提高
The Sm-Fe-N magnetic thin film was successfully fabricated by ion beam mixing method in the Sm-Fe multi-layer thin film with a mass fraction of Sm of 20% when N ions with an energy of 60keV were implanted. Transmission electron microscopy (TEM) and X-ray diffraction (XRD) analysis showed that Sm2Fe17Nx magnetic thin films were formed when the implanting dose of N ions was 1 × 10 17 / cm 2 and that of Sm 2 Fe 17 Nx was 2 × 10 17 / cm 2 -Fe multi-layer thin film into amorphous magnetic film, and Sm2Fe17Nx magnetic film and Sm-Fe-N amorphous magnetic film magnetic (saturation magnetic strength, coercivity) compared with the Sm-Fe thin film prior to injection has obvious improve