论文部分内容阅读
分别采用氮离子束增强沉积和N－Ti离子束同步增强沉积工艺制备了Mo_2N和Mo_(2-x)TixN薄膜，用XRD、TEM、划痕和阳极极化方法研究了两者的结构与性能。结果表明，N－Ti离子束同步增强沉积工艺制备的Mo_(2-x)Ti_xN薄膜的膜基结合力、致密性和抗腐蚀性能均优于氮离子增强沉积的Mo_2N薄膜，Mo_(2-x)Ti_xN薄膜划痕临界载荷达3000gf，比Mo_2N薄膜提高一倍。自腐蚀电位从Mo_2N薄膜的32mV提高到Mo_(2-x)Ti_xN薄膜的166mV，自腐蚀电流相应地从0.5μA/cm~2减小到0．26μA/cm~2。Mo_(2-x)TixN薄膜的结构是Mo_2N的f.c.c结构。
Mo_2N and Mo_ (2-x) TixN thin films were prepared by nitrogen ion beam enhanced deposition and N-Ti ion beam synchronous enhanced deposition. The structures and properties of the films were studied by XRD, TEM, scratch and anodic polarization . The results show that the film-based adhesion, compactness and corrosion resistance of Mo 2-x Ti x N films deposited by N-Ti ion beam synchronous enhanced deposition are superior to that of Mo 2 N films doped with nitrogen ions. ) Ti_xN film scratch critical load up to 3000gf, compared with Mo_2N film doubled. The corrosion potential increased from 32mV of Mo_2N film to 166mV of Mo_ (2-x) Ti_xN film, and the self-corrosion current decreased from 0.5μA / cm ~ 2 to 0.26μA / cm ~ 2. The structure of Mo_ (2-x) TixN thin films is the f.c.c structure of Mo_2N.