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半导体生产中的薄膜沉积工艺通常对真空泵的要求很严格。在该工艺中高故障率和停机现象较为普遍。iH真空泵是特别为应付恶劣的薄膜工艺环境所设计。阐述了iH系列干泵在LPCVD氮化硅工艺应用中的成功表现。
Thin-film deposition processes used in semiconductor manufacturing often require very stringent vacuum pumps. In the process of high failure rates and downtime is more common. iH vacuum pump is especially designed to cope with the harsh film process environment. The successful performance of iH series dry pump in LPCVD silicon nitride process is expounded.