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用中频脉冲反应磁控溅射法,在溅射功率为78W,93W和124W以及衬底温度分别为室温,500℃及677℃下制备了氧化铒涂层.采用原子力显微镜、纳米压痕、X射线衍射和掠入射X射线衍射法研究了涂层的形貌、力学性能及物相结构.测量了涂层的电学性能.结果显示,脉冲磁控溅射沉积氧化铒涂层具有较高的沉积速率.实验制备得到了单斜相结构的氧化铒涂层.提高溅射功率时,沉积速率从28nm/min增大至68nm/min,涂层的结晶质量显著下降.提高衬底温度至500℃和677℃时,单斜相衍射峰强度下降.分析认为,较低的衬底温度和较高沉积速率有利于氧化铒涂层形成单斜相结构.涂层的硬度和弹性模量分别为11.9—15.7GPa和179—225GPa.室温至677℃制备的涂层均具有较高的电阻率,为(1.5—3.1)×1012Ω·cm,满足聚变堆包层绝缘涂层的应用要求.
An erbium oxide coating was prepared by MF magnetron sputtering at sputtering powers of 78W, 93W and 124W and substrate temperatures of room temperature, 500 ℃ and 677 ℃, respectively.Anomic force microscope, nanoindentation, X Ray diffraction and grazing incidence X-ray diffraction were used to study the morphology, mechanical properties and phase structure of the coating.The electrical properties of the coating were measured.The results show that the deposition of erbium oxide by pulsed magnetron sputtering has high deposition The erbium oxide coating with monoclinic phase structure was prepared experimentally.When the sputtering power was increased, the deposition rate increased from 28nm / min to 68nm / min, the crystalline quality of the coating decreased significantly.The substrate temperature was raised to 500 ℃ And 677 ℃, the diffraction peak intensity of monoclinic phase decreased.The analysis shows that the lower substrate temperature and the higher deposition rate are beneficial to the monoclinic phase structure of erbium oxide coating.The hardness and elastic modulus of the coating are respectively 11.9 -15.7GPa and 179-225GPa. The coatings prepared from room temperature to 677 ℃ have high resistivity of (1.5-3.1) × 1012Ω · cm, which meets the application requirements of fusion stack insulation coating.