一、引言硅单晶的热处理工艺在我国已开始受到重视,并开展了这方面的研究工作。在国外,热处理工艺已经是许多半导体硅生产厂家的必要工艺环节。热处理的好处在于: (a) 稳定电阻率,改善截面均匀性,消除杂质条纹; (b) 消除晶体内应力和机械损伤; (c) 稳定位错,减小它的有害影响; (d) 消除微缺陷,杂质微沉淀。 I. INTRODUCTION The heat treatment process of single crystal silicon has begun to be taken seriously in our country and carried out research in this field. Abroad, heat treatment process is already the necessary process of many semiconductor silicon manufacturers. The benefits of heat treatment are to: (a) stabilize the resistivity, improve cross-sectional uniformity and eliminate streaks of impurities; (b) eliminate intra-crystal stress and mechanical damage; (c) stabilize dislocations and reduce their harmful effects; Micro-defects, micro-precipitation of impurities.