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本文报道溅射工艺、退火工艺和冷却方式对磷扩散法制备的p型ZnO薄膜的微观结构和电学特性的影响的实验研究。研究结果表明,ZnO薄膜的表面形貌、结晶度、内应力以及电学特性均与制备工艺条件有密切的关系。文章对这些关系的机理做了探讨和分析。
This paper reports the effects of sputtering, annealing and cooling methods on the microstructure and electrical properties of p-type ZnO thin films prepared by phosphorus diffusion. The results show that the surface morphology, crystallinity, internal stress and electrical properties of ZnO thin films are closely related to the preparation conditions. The article discusses and analyzes the mechanism of these relations.