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采用矩形气体离子源复合磁控溅射技术制备W掺杂的类金刚石薄膜,研究了大气下室温到500℃对薄膜结构稳定性及摩擦学性能的影响。利用扫描电镜、X射线衍射仪、拉曼光谱仪、三维表面轮廓仪分析了薄膜的微观结构,采用摩擦磨损试验仪分析了薄膜的摩擦学性能。结果表明,室温下薄膜结构致密,主要由非晶碳中弥散分布纳米晶WC1-x相组成,薄膜具有良好的耐磨性能。当退火温度达到300℃以上时薄膜发生了氧化,并发生石墨化转变,磨损率增加。随着退火温度进一步升高,薄膜氧化严重,摩擦系数升高,耐磨性能降低,500℃时薄膜已完全失效。
W-doped diamond-like carbon films were prepared by rectangular magnetron sputtering and magnetron sputtering. The effects of room temperature to 500 ℃ on the stability and tribological properties of the films were investigated. The microstructure of the films was analyzed by scanning electron microscopy, X-ray diffraction, Raman spectroscopy and three-dimensional surface profilometer. The tribological properties of the films were analyzed by friction and wear tester. The results show that the structure of the film is compact at room temperature, mainly composed of nanocrystalline WC1-x phase dispersed in amorphous carbon, and the film has good wear resistance. When the annealing temperature reaches above 300 ℃, the film is oxidized and graphitized, the wear rate increases. With the further increase of the annealing temperature, the film oxidized seriously, the friction coefficient increased, the wear resistance decreased, and the film had completely failed at 500 ℃.