1.产生高密度金属离子的HCD蒸镀法 过去真空蒸镀和溅镀,曾被光学和半导体工业广泛采用,做为一种近乎理想的无公害镀膜法,代替了温式镀膜,但是进入70年代以来,人们对于这些方法做了认真的研究。尤其是离子镀是有发展前途的代用手段,引起了很多人的注意。所谓离子镀,就是在蒸发物 1. HCD vapor deposition of high-density metal ions Past vacuum deposition and sputtering have been widely adopted by the optical and semiconductor industries as a near-ideal, pollution-free coating method instead of a temperature-dependent coating, however, Since the age, people have carefully studied these methods. In particular, ion plating is a promising alternative means of arousing the attention of many people. The so-called ion plating, is in the evaporation