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采用CVD技术实现了Al2O3薄膜的数字化生长,实验结果表明这种生长方法具有生长温度低、层厚可控等特点,生长出的薄膜每周期生长厚度约为1.19。
The results show that this growth method has the characteristics of low growth temperature and controllable layer thickness. The thickness of the growth film is about 1.19 per cycle.