论文部分内容阅读
用俄歇电子能谱分析和深度方向分析方法研究了高纯Al-5.5Zn-2.5Mg合金所形成的氧化膜成分与热处理、晶粒大小、贮存环境以及温度的关系。本研究表明,在摸拟的热处理条件下,氧化膜主要是MgO。这种氧化膜的Mg/O的峰——峰高度比值对于热处理温度是敏感的,在475℃达到最大值。在以后的贮存期间,尤其在潮湿的环境中,此膜的成分发生显著的变化。由于热处理时氧化膜的表层形成了富Al的氧化物,Mg/Al比值减小了。本文提出了一个说明在富Al氧化物生长期间氧化膜成分变化情况的模型。
The relationship between the oxide film formed by high purity Al-5.5Zn-2.5Mg alloy and heat treatment, grain size, storage environment and temperature was studied by Auger electron spectroscopy and depth direction analysis. This study shows that in the simulated heat treatment conditions, the oxide film is mainly MgO. The Mg / O peak-to-peak height ratio of this oxide film is sensitive to the heat treatment temperature and reaches a maximum at 475 ° C. During later storage, especially in wet conditions, the composition of the membrane changes significantly. Since the surface of the oxide film forms an Al-rich oxide during the heat treatment, the Mg / Al ratio decreases. This paper presents a model that illustrates the changes in oxide film composition during Al rich oxide growth.