使用x射线衍射 (XRD)、x射线光电子谱 (XPS)、高分辨透射电子显微镜 (HRTEM)和原子力显微镜 (AFM)多种观测手段分析了TiN薄膜和Ti1 -xSixNy 纳米复合薄膜的微观结构 .实验分析证明Ti1 -xSixNy 薄膜是由直径为 3—5nm的纳米晶TiN和非晶Si3N4 相构成 ,并且Ti1 -xSixNy 薄膜的表面粗糙度小于相同条件下制备的TiN薄膜 ,在Ti1 -xSixNy 薄膜体系的自由能中引入界面能的概念 ,在此基础上分析了体系中TiN晶粒的取向问题 . The microstructures of TiN films and Ti1-xSixNy nanocomposite films were analyzed by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), high resolution transmission electron microscopy (HRTEM) and atomic force microscopy (AFM) It is proved that the Ti1-xSixNy thin films are composed of nanocrystalline TiN and amorphous Si3N4 with diameters of 3-5 nm, and the surface roughness of Ti1-xSixNy thin films is less than that of TiN thin films prepared under the same conditions. In the Ti1-xSixNy thin film system, The concept of interfacial energy can be introduced, and on this basis, the orientation of TiN grains in the system has been analyzed.