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综述了Ti-N系薄膜结构研究的若干重要问题。着重讨论了δ-TiN的非化学计量性和物理气相沉积过程非平衡性对于Ti-N系膜相组成的影响。从耐磨应用考虑,ε-Ti_2N相或其复相涂层具有优势。透射电镜横截面试样研究阐明了Ti-N膜的分层精细结构,包括其各相的空间分布、择优取向、各层间的取向关系、晶粒度及界面反应层。论述了Ti底层的作用。研究了薄膜结构的一系列力学效应,例如离子轰击、合金化和多层化等引起的薄膜晶粒细化效应;晶粒细化和多层化导致的薄膜硬度增强和韧化,离子轰击追成的膜基界面强化等。上述结果对于改善Ti-N超硬膜性能,扩大其应用,均有重要作用。
Several important problems in the research of Ti-N film structure are reviewed. The effects of the non-stoichiometry of δ-TiN and the unbalanced physical vapor deposition process on the phase composition of Ti-N films are emphatically discussed. From the wear-resistant applications, ε-Ti 2 N phase or its multi-phase coating has the advantage. TEM study of cross-section specimens clarified the fine structure of Ti-N film, including the spatial distribution of each phase, the preferred orientation, the orientation of the layers, grain size and interface reaction layer. The effect of Ti underlayer is discussed. A series of mechanical effects on the structure of the thin film have been studied, for example, grain refinement effect caused by ion bombardment, alloying and multi-layering. The film hardness enhancement and toughening caused by grain refinement and multi-layering, ion bombardment chase Into the film-based interface enhancement. The above results for improving the performance of Ti-N superhard film, expanding its application, have an important role.