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半导体多层液相外延生长技术乃是目前集成光学研究中制备各功能部件及各充电器件的主要工艺手段.生长中都有一个外延层厚度控制的问题.从理论计算可知层厚正比于降温速率.因此,整个外延过程不但需要精密温度控制,而且有一个升温-恒温-以及以不同速率不断降温的过程. 本仪器为满足上述要求,设有升、降温速率选择,恒温温度选择和恒温时间选择三组码盘,使温度控制可按工艺要求预选,并进行预置→升温→恒温→降温
Semiconductor multi-layer liquid-phase epitaxial growth technology is currently integrated optical research in the preparation of the various functional components and the charging device of the main process means. Growth has a thickness of the epitaxial layer control problem. Theoretical calculations show that the layer thickness is proportional to the cooling rate Therefore, the entire epitaxial process not only requires precise temperature control, but also has a temperature - constant temperature - and at different rates continue to cool down the process to meet the above requirements, the instrument has a rise and fall cooling rate selection, temperature and temperature selection thermostat time selection Three sets of code wheel, the temperature control can be pre-selected according to process requirements, and pre-set → → → temperature → constant temperature cooling