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十、HCD反应沉积的氮化钛膜 HCD反应沉积氮化钛膜的镀膜条件可反映所镀氮化钛膜的色泽特征,如佐藤等人通过控制N_2、H_2的分压得到了各种颜色的膜。金色的膜经X线衍射分析可知是由Ti_2N或TiN+Ti_2N组成的。这种膜的硬度大于或等于2000公斤/毫米~2(DPHN)。 该膜的镀膜典型参数如下:氩气流为23厘米~3/分(标准温度、压强),氩分压为7.4×10~(-4)托,放电参数为40伏、80安培,靶距为14厘米,膜的典型沉积率为0.25微米/分。氮气
X, HCD reaction deposition of titanium nitride film HCD reaction deposition of titanium nitride film coating conditions can reflect the color of the titanium nitride coating film characteristics, such as Sato et al by controlling the N2, H2 partial pressure obtained a variety of colors membrane. Gold film by X-ray diffraction analysis shows that is composed of Ti_2N or TiN + Ti_2N composition. The hardness of this film is greater than or equal to 2000 kg / mm 2 (DPHN). Typical parameters of the film coating are as follows: argon flow of 23 cm ~ 3 / min (standard temperature, pressure), argon partial pressure of 7.4 × 10 ~ (-4) Torr, discharge parameters of 40 volts, 80 amps, target distance 14 cm, the typical deposition rate of the film is 0.25 microns / minute. Nitrogen