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为了提高微驱动器的性能,提出了一种在氧化铟锡(ITO)玻璃上加工高深宽比SU-8微结构的方法.在导电玻璃的ITO层上涂覆一薄层AZ-4620正光胶,用常规的接触式曝光法,将光刻掩模上的二维图形转移到AZ-4620光胶层上,显影后利用ITO玻璃的导电性,在AZ-4620光胶曝光处电沉积镍,原掩膜图形可保真地转移到ITO玻璃表面的镍镀层上,使紫外光透过ITO玻璃基底进行反面曝光,从而保证了光刻掩模与SU-8光胶层间的完全接触,消除了厚光胶层表面不平在曝光时的散射和基片材料的反射影响,成功制备了深宽比为16、侧壁垂直度为89.5°的微结构.本方法使用设备简单,加工成本低.
In order to improve the performance of the micro-actuator, a method of processing the high aspect ratio SU-8 microstructure on indium tin oxide (ITO) glass is proposed. A thin layer of AZ-4620 positive photoresist is coated on the ITO layer of the conductive glass, Using a conventional contact exposure method, the two-dimensional pattern on the photolithography mask is transferred to the AZ-4620 optical adhesive layer. After development, ITO glass is used for electrodeposition of nickel and AZ The mask pattern can be faithfully transferred to the nickel coating on the surface of the ITO glass, exposing the UV light to the ITO glass substrate for backside exposure, thereby ensuring complete contact between the lithography mask and the SU-8 coating. The surface unevenness of the thick adhesive layer is affected by the scattering during exposure and the reflection of the substrate material, and the microstructure having an aspect ratio of 16 and a vertical sidewall degree of 89.5 ° has been successfully prepared. The method has the advantages of simple equipment and low processing cost.