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对于热压印光刻而言,制备具有精确几何结构、良好耐磨损性能以及长使用寿命模板至关重要。在分析现有Si或SiO2模板使用性能基础上,提出了在TiN涂层/玻璃基体上制备热压印模板。首先采用直流磁过滤电弧在玻璃上沉积TiN薄膜,然后,通过聚焦离子束在薄膜上加工出最小线宽71nm的栅型结构,最后,使用所加工的模板,进行热压印实验,获得了良好的压印结果。实验结果表明,TiN作为模板材料可以获得高保真度的纳米图案,并且由于TiN比Si或SiO2具有更高硬度和强度,玻璃基体也具有很好的机械性能,由TiN/玻璃系统制备的压印模板的机械性能和使用寿命较之Si或SiO2基模板得到很大提高。
For hot imprint lithography, it is important to prepare templates with precise geometry, good wear resistance, and long life. Based on the analysis of the performance of the existing Si or SiO2 templates, a hot stamping template is proposed on a TiN coated / glass substrate. Firstly, a DC magnetic filtered arc was used to deposit a TiN film on the glass. Then, a gate structure with a minimum line width of 71 nm was fabricated on the film by focused ion beam. Finally, hot embossing experiments were performed using the processed template to obtain a good Imprint results. The experimental results show that TiN can be used as template material to obtain high-fidelity nano-pattern, and because TiN has higher hardness and strength than Si or SiO2, the glass matrix also has good mechanical properties. TiN / glass system prepared by the imprint Template mechanical properties and service life than the Si or SiO2-based template has been greatly improved.