用电子束蒸发的方法在Ti盘上沉积氧化钛薄膜。分别用场发射扫描电镜,X射线光电子谱和X射线衍射分析所制备薄膜的表面形貌、化学成分和晶体结构,所制备的氧化钛薄膜的晶体结构依赖于制备过程中的沉积参数,薄膜的成分主要为金红石结构,是包含TiO2,Ti2O3和TiO三种结构的多晶体,随着沉积过程中氧气流量的增加,所制备的薄膜中高价钛离子(如Ti4+)的含量不断增大,同时低价钛离子(如Ti2+)的含量不断减小。随着氧气流量的增加和后续热处理温度的升高,薄膜的结晶度不断增大,并呈现出单一金红石(101)相位的趋势。 Titanium oxide films were deposited on Ti disks by electron beam evaporation. The surface morphology, chemical composition and crystal structure of the prepared films were characterized by field emission scanning electron microscopy, X-ray photoelectron spectroscopy and X-ray diffraction. The crystal structure of the prepared TiO2 films depends on the deposition parameters during the preparation process, the composition of the films Mainly rutile structure, is a polycrystal containing three structures of TiO2, Ti2O3 and TiO. With the increase of the oxygen flow rate in the deposition process, the content of high-priced titanium ions (such as Ti4 +) in the prepared film is continuously increased, Titanium ions (such as Ti2 +) content continues to decrease. With the increase of oxygen flow rate and the subsequent heat treatment temperature, the crystallinity of the films increases and shows the phase of single rutile (101).