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光源掩膜协同优化是45 nm节点以下浸没式光刻提高分辨率的重要途径之一,为了重构其优化后输出的像素级光源,提出了一种基于可寻址二维微反射镜阵列的新型照明模式变换系统设计方法。分析了减少重构光源所需微反射镜数量的原理,结合成像与非成像光学,利用柱面复眼透镜,获得了入射到微反射镜阵列上的非均匀的特定光强分布,基于此光强分布对微及射镜二维偏转角度进行了模拟及优化,并对该照明模式变换系统进行仿真,结果表明,光瞳重构精度小于2.5%,X,Y方向光瞳极平衡性小于0.5%,Prolith中重构光源的曝光性能仿真结果满足要求。与类似的系统相比,该系统仅用不足4000个镜单元即可达到设计要求,适用于集成度高的下一代浸没式光刻系统。
The cooperative optimization of light source mask is one of the important ways to improve the resolution of submerged lithography below 45 nm. In order to reconstruct the optimized output pixel-level light source, an array based on addressable two-dimensional micro-mirror array New lighting mode conversion system design method. The principle of reducing the number of micromirrors required to reconstruct a light source is analyzed. Combining with imaging and nonimaging optics, a non-uniform light intensity distribution incident on the micromirror array is obtained using a cylindrical fly-eye lens. Based on this light intensity The distribution of micro-and two-dimensional lens deflection angles are simulated and optimized, and the illumination mode transformation system is simulated. The results show that the pupil reconstruction accuracy is less than 2.5% and the pupil balance in X and Y directions is less than 0.5% , Prolith reconstruction light source simulation results of the exposure to meet the requirements. Compared to similar systems, the system meets design requirements in less than 4000 mirror units for the next generation of integrated immersion lithography systems.