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采用Ａｒ＋离子束溅射沉积技术在钛基体上沉积羟基磷灰石薄膜涂层，Ａｒ＋离子束的能量分别为０．９ｋｅＶ、１．２ｋｅＶ和１．５ｋｅＶ。利用Ｘ射线衍射（ＸＲＤ）、扫描电镜（ＳＥＭ）、透射电镜（ＴＥＭ）和红外光谱（ＦＴＩＲ）等检测方法，对制备的羟基磷灰石薄膜涂层进行了表征。Ｘ射线衍射和透射电镜结果表明该薄膜涂层为非晶态；红外光谱中无羟基（ＯＨ－）特征峰存在，ＣＯ＝３根吸收峰的出现说明制备过程中会引入ＣＯ＝３根；扫描电镜观察结果显示出制备的羟基磷灰石薄膜涂层致密、均匀；划痕实验结果表明涂层与钛基体间的结合紧密。以上结果表明，离子束溅射沉积技术可以用于沉积羟基磷灰石薄膜涂层钛种植材料，制备修复体和金属种植体
Hydroxyapatite thin film coatings were deposited on a titanium substrate by Ar + ion beam sputtering deposition. The energy of the Ar + ion beam was 0.9 keV, 1.2 keV and 1.5 keV, respectively. The prepared hydroxyapatite films were characterized by XRD, SEM, FTIR and other methods. X-ray diffraction and transmission electron microscopy results show that the film coating is amorphous; there is no hydroxyl (OH-) characteristic peak in the infrared spectrum, the presence of CO = 3 absorption peaks indicates that CO = 3 will be introduced during the preparation; Electron microscopy results showed that the prepared hydroxyapatite thin film coating was dense and uniform; scratch test results show that the coating and the titanium matrix bonded tightly. The above results show that the ion beam sputtering deposition technology can be used to deposit hydroxyapatite thin film coated titanium implant material, the preparation of prostheses and metal implants