提出一种反面水浴斜曝光的方法用于制作主光轴平行于基底的微透镜阵列。已有的水浴斜曝光法中,由于基底处光刻胶获得曝光剂量较少而不易充分交联固化,在显影时出现与基底粘附不牢固,导致成品率较低。反面水浴斜曝光的方法,是通过光刻以及溅射工艺在玻璃基底上复制掩膜图形,匀光刻胶之后,采用玻璃基底朝上、光刻胶朝下的曝光方法,此方法得到的光刻胶结构很容易牢固地固定在玻璃基底上,显影时不易脱落,提高了成品率,同时有利于后续倒模复制工艺。用该方法获得的透镜直径约为200μm。 A method of oblique exposure to a backwater bath is proposed for fabricating a microlens array having a main optical axis parallel to the substrate. The existing water bath oblique exposure method, due to the exposure at the substrate to obtain a smaller exposure dose is not easy to fully cross-linked curing, adhesion occurs in the substrate adhesion is not strong, resulting in lower yield. The reverse oblique water bath exposure method is through photolithography and sputtering process to reproduce the mask pattern on a glass substrate, after the photoresist, the glass substrate facing up, the photoresist down exposure method, the light obtained by this method The photoresist structure is easily and firmly fixed on a glass substrate, which is hard to fall off during development, improves the yield, and is beneficial for the subsequent in-mold copying process. The lens diameter obtained by this method is about 200 μm.