采用等离子体增强射频磁控溅射沉积方法,在室温下制备了Fe-O合金薄膜。研究了氧的掺杂量和薄膜厚度对薄膜软磁和高频特性的影响。结果发现少量氧的掺杂不导致低饱和磁化强度铁氧化物的形成,但可使薄膜晶粒细化,矫顽力下降。在薄膜厚度低于150nm且氧气与氩气相对流量比为2.4%的条件下,薄膜的实部磁导率高达1100且能够维持到1GHz. The plasma enhanced RF magnetron sputtering deposition method was used to prepare Fe-O alloy thin films at room temperature. The effect of oxygen doping amount and film thickness on the soft magnetic and high frequency properties of the films was investigated. As a result, it was found that the doping of a small amount of oxygen did not lead to the formation of a low saturation magnetization iron oxide, but the grain of the thin film was refined and the coercive force was decreased. The real part permeability of the film is as high as 1100 and can be maintained to 1 GHz with a film thickness of less than 150 nm and a relative flow rate of oxygen to argon of 2.4%.