通过液－固逐步溶解缩聚的方法，合成了几种有较高分子量的光敏聚酰胺酸酯（ＰＩ前体），并对它们的光刻性能进行了研究和讨论。其中，米蚩酮或双叠氮对以联苯二酐、间苯二胺残基为主链结构的光敏ＰＩ前体的感光性能有最大的影响，由这种ＰＩ前体配制的光敏聚酰亚胺光刻胶具有最高的灵敏度。同时，本文也对这些ＰＩ前体的热酰亚胺化反应做了一些有益的探讨。 Several photo-sensitive polyamic acid esters (PI precursors) with higher molecular weight were synthesized by liquid-solid step-wise polycondensation, and their photolithographic properties were studied and discussed. Among them, Michler’s ketone or bis-azide has the most influence on the photosensitive properties of the photosensitive PI precursors with biphenyl dianhydride and m-phenylenediamine residues as the main chain structure. Photosensitive poly Imine photoresists have the highest sensitivity. At the same time, this paper also made some beneficial discussions on the thermal imidization reaction of these PI precursors.