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文中提出一种扩展的薄膜微观结构的区域相图,可以用其来表征过滤阴极弧以及高功率脉冲磁控溅射镀膜过程中含有大量离子流的动态沉积过程。其坐标轴包括广义同系温度,标量化动能以及可以表征离子刻蚀作用的净膜厚。需要强调的是,由于影响薄膜生长的实际参数要远超相图中有限的坐标轴数,因此该结构区域相图展示的生长条件与薄膜结构之间的关系是近似和简化过的。
In this paper, an extended phase diagram of the microstructure of a thin film is proposed, which can be used to characterize the dynamic deposition process with a large number of ion fluxes in a filtered cathode arc and in high power pulsed magnetron sputter coating. Its axes include generalized homologous temperatures, scalar kinetic energy, and net film thickness that characterizes ion etching. It should be emphasized that the relationship between the growth conditions and the film structure shown in the phase diagram of the structure area is approximate and simplified because the actual parameters that affect the growth of the film far outweigh the limited number of axes in the phase diagram.