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研究了磁控溅射制备Sub/NiCrN_x/Ag/NiCrN_x/SiN_x/Air多层结构银反射镜的特性,分析了N_2对Ag薄膜、介质保护层及银反射镜光谱的影响。采用深度剖析X射线光电子能谱和透射电子显微镜分析了银反射镜短波波段(400~500nm)反射率偏低的原因。采用分光光度计、扫描电子显微镜和X射线衍射仪研究了N_2占比对Ar/N_2混合气体溅射制备单层银膜光学性质、表面形貌及晶向结构的影响,比较了不同Ar/N_2比例混合气体溅射制备银反射镜的反射率,并分析了对应样品SiN_x保护层的化学计量比。实验结果显示,溅射制备银膜时,在Ar中引入一定比例的N_2,SiN_x保护层的化学计量比得到改善。当N_2体积比由0上升至40%时,Ar/N_2混合气体溅射制备的银反射镜在400nm波长处反射率由71.7%提高到79.3%。此外,基于Ar/N_2混合气体溅射溅射制备的银反射镜样品具备优良的环境稳定性。
The properties of Ag / NiCrN_x / SiN_x / Air multi-layered silver mirrors prepared by magnetron sputtering were studied. The effects of N_2 on the Ag thin film, the protective layer and the silver reflector were analyzed. The reasons for the low reflectance in the short wavelength band of the silver mirror (400 ~ 500nm) were analyzed by depth analysis X-ray photoelectron spectroscopy and transmission electron microscopy. The effects of N 2 proportion on the optical properties, surface morphology and crystal structure of single-layer silver films prepared by Ar / N 2 mixed gas sputtering were investigated by spectrophotometer, scanning electron microscopy and X-ray diffraction. The reflectance of silver mirror was prepared by sputtering with proportional gas mixture, and the stoichiometry of SiN_x protective layer was analyzed. The experimental results show that the stoichiometric ratio of SiN_x protective layer is improved when a certain proportion of N_2 is introduced into Ar during sputtering. When the volume ratio of N_2 was increased from 0 to 40%, the reflectance of the silver mirror prepared by Ar / N_2 mixed gas sputtering increased from 71.7% to 79.3% at the wavelength of 400 nm. In addition, silver mirror samples prepared by sputtering of Ar / N 2 mixed gas have good environmental stability.