光学薄膜,如各种增透膜、干涉滤光片、偏振膜、分光膜和近年来发展起来的激光膜,已成为各种光学仪器中不可缺少的部件。同时对光学膜的质量提出越来越高的要求。膜层的均匀性就是一个重要方面。从理论上讲为了获得均匀的光学薄膜要求蒸发源为一点源,而镀膜基体应当位于以点蒸发源为中心的球面上。然而蒸发源实际上有一定长度,基体又位于一个平面上。因此蒸发后得不到理想均匀的膜层。实践证明使基体做公转和自转是获得均匀膜层 Optical films, such as various AR coatings, interference filters, polarizing films, spectral films and laser films developed in recent years, have become indispensable components in various optical instruments. At the same time the quality of the optical film put forward higher and higher requirements. Film uniformity is an important aspect. Theoretically, in order to obtain a uniform optical thin film, the evaporation source is required as a point source, and the coated substrate should be located on the spherical surface centered on the point evaporation source. However, the evaporation source actually has a certain length, and the substrate is located on a plane. Therefore, an ideal and uniform film can not be obtained after evaporation. Practice has proved that the matrix to make revolution and rotation is to obtain a uniform film