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采用射频溅射三氧化钨粉末靶的技术 ,在不同的氧分压条件下沉积得到非晶态WO3电致变色薄膜 ,分析得知氧分压为 1∶10的样品变色性能更好些 .采用x射线衍射 (XRD) ,原子力显微镜 (AFM) ,伏安特性曲线和分光光度计分析所制备薄膜的特性 .将薄膜在 1 5mol L的LiClO4 的丙稀碳酸脂 (PC)溶液进行电化学反应 .发现氧分压在 1∶10的情况下沉积得到的薄膜呈非晶态 ,薄膜有较多的孔隙 ,这有利于Li+ 的抽取 ,进而显示出很好的变色性能 .x射线光电子能谱 (XPS)成分分析表明WO3薄膜在原态中只有W和O两种原子电色反应后的主要成分为LixWO3,它是W6 + 和W5+ 的混合价态的钨青铜 .分别在 2 30和 4 0 0℃热处理 90min ,分析表明在 4 0 0℃热处理后循环 10次以上的薄膜有更好的变色性能
Using RF sputtering of tungsten trioxide powder target, amorphous WO3 electrochromic thin films were deposited under different oxygen partial pressure conditions, the analysis shows that the oxygen partial pressure of 1:10 sample discoloration performance is better.Using x The properties of the prepared films were analyzed by XRD, AFM, voltammetry and spectrophotometer.The electrochemical reaction of the films in a solution of LiClO4 in propylene carbonate (PC) The film deposited under the oxygen partial pressure of 1:10 is amorphous, and the film has more pores, which is conducive to the extraction of Li + and thus shows good color changing properties.X-ray photoelectron spectroscopy (XPS) The compositional analysis showed that the main component of the WO3 thin film was only LixWO3, which is the mixed valence tungsten W6 + and W5 +, after heat treatment at 230 and 440 ℃ for 90min , The analysis shows that the film after heat treatment at 400C for more than 10 times has better color changing properties