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本文报道了用紫外线诱变的方法处理菌株(K.pneumoniae)549,经两次诱变处理,分别筛选到一株具有抗Km400γ的菌株M-1-5-5和一株固氮活性较高的菌株M-1.Km对549和M-1的最低抑菌浓度随着涂皿浓度的变化而改变,菌液浓度10~4时,抑菌浓度为1.5—6.25单位/毫升.突变菌株M-1和M-1-5-5基本保持原出发菌株549的特征,在液体培养时M-1和M-1-5-5的生长速度比549快.试验表明M-1-5-5的抗性基因不在质粒上,连续传代试验说明其抗性具有稳定性.
In this paper, K.pneumoniae strain 549 was treated by UV mutagenesis. After two mutagenesis treatments, one strain M-1-5-5 with anti-Km400γ and one strain with high nitrogen fixation activity The minimum inhibitory concentrations (MICs) of strain M-1.Km against 549 and M-1 varied with the concentration of the plating solution, and the antibacterial concentration ranged from 1.5 to 6.25 units / 1 and M-1-5-5 maintained the characteristics of the original strain 549, and M-1 and M-1-5-5 grew faster than 549 in liquid culture.The results showed that M-1-5-5 Resistance gene is not on the plasmid, continuous passage test shows that the stability of its resistance.