With the development of MEMS technology,the traditional thermal diffusion process is commonly replaced by the implantation technique. The ion implantation has a unique advantage that the number and the depth of the implanted ions in the devices can be precisely controlled,so the devices can be easily duplicated. Unfortunately,the implantation also has some disadvantages,such as:a)more lattice defects are produced by the ion implantation;b) With the development of MEMS technology, the traditional thermal diffusion process is generally replaced by the implantation technique. The ion implantation has a unique advantage that the number and the depth of the implanted ions in the devices can be precisely controlled, so the devices can be Sorry, the implantation also has some disadvantages, such as: a) more lattice defects were produced by the ion implantation; b)