研制了多离子束反应溅射技术并运用该技术在多种衬底上制备晶态（Ｐｂ，Ｌａ）ＴｉＯ３铁电薄膜。运用多种分析技术对铁电薄膜的物化性能进行了表征。发现在铁电薄膜的近表面有富铅层。测试了铁电薄膜的电滞回线、矫顽场、折射率、吸收系数等电学和光学参数。利用该技术可在较低衬底温度下在位制备组分可调、附着力强的外延或高度择优取向的铁电薄膜。 A multi-ion beam reactive sputtering technique was developed and used to fabricate crystalline (Pb, La) TiO3 ferroelectric thin films on a variety of substrates. The use of a variety of analytical techniques to characterize the physical and chemical properties of ferroelectric thin films. Found in the ferroelectric film near the surface of the lead-rich layer. The electrical and optical parameters such as hysteresis loop, coercive field, refractive index and absorption coefficient of ferroelectric thin films were tested. Using this technique, an epitaxial or highly preferred oriented ferroelectric thin film with adjustable composition, strong adhesion and low temperature can be prepared in situ at a lower substrate temperature.