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在极值法光学膜厚监控中,使用多少监控片且何时更换(即监控片更换策略)在一定程度上是该膜系镀制成功与否的一个关键因素。分析了在反射式极值法光学监控中监控片更换策略的数值模型。根据大量的实验得到的工艺参数,在不同过正控制量下首次进行了监控片更换策略优化的沉积仿真模拟。结果表明:在多腔结构膜系的沉积过程中存在着“假性”极值,容易导致某些膜层厚度的严重误差。不同的过正控制量对光学监控效果会产生明显地影响;所给定的过正控制量存在着最佳的监控片更换策略;合适的变过正控制量可进一步改善薄膜的光学性能。
In extreme-value optical film thickness monitoring, how many monitors to use and when to change (ie, monitor-chip replacement strategy) is to some extent a crucial factor in the success of the film plating. The numerical model of monitor replacement in optical monitoring of reflective extremum method is analyzed. According to a large number of experimentally obtained process parameters, the sedimentation simulation simulation for the optimization of the replacement strategy of the monitoring piece was carried out for the first time under different overcorrection control quantities. The results show that there exist “pseudo” extremums in the deposition process of multi-cavity structure film system, which easily lead to serious errors of some film thickness. Different overcorrection quantities have a significant influence on the optical monitoring effect. The optimal overlay control strategy exists for the optimal monitoring sheet replacement strategy. Appropriate change of the positive control amount can further improve the optical performance of the film.