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The surface roughness, hardness and tribological properties of tungsten (W) and tung-sten nitride (WN_x) thin films prepared by dc magnetron sputtering and reactive magnetron sputter-ing in Ar-N_2 gas mixtures have been studied using atomic force microscopy (AFM), nanoindenta-tion measurements and ball-on-disc wear testing. A pronounced surface roughness was observedonly for films under compressive strains. The surface was flat under tension but rough under com-pression. Similar hardness with value about 20 GPa were observed in the W and WN_x (x=0.3)films. This is thought to be due to the fact the grains are restricted to a very small size in the coat-ings. The higher coefficients of friction (0.4 for W and 0.9 for WN_(0.3)) suggest that WN_(0.3) is not theoptimum phase. Finally, discussions are made with tribological test results.
The surface roughness, hardness and tribological properties of tungsten (W) and tung-sten nitride (WN_x) thin films prepared by dc magnetron sputtering and reactive magnetron sputter-ing in Ar-N2 gas mixtures have been studied using atomic force microscopy (AFM) , nanoindenta tion measurements and ball-on-disc wear testing. A pronounced surface roughness was observed on for films under compressive strains. The surface was flat under tension but rough under com-pression. Similar hardness with value about 20 GPa were observed in the W and WN_x (x = 0.3) films. This is thought to be due to the fact the grains are restricted to a very small size in the coat -ings. The higher coefficients of friction (0.4 for W and 0.9 for WN_ (0.3) ) suggest that WN_ (0.3) is not the optimum phase. Finally, discussions are made with tribological test results.