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利用静态高压釜,在330℃的10%NaOH+10 g/L PbO腐蚀介质中,对690TT合金进行5～60 d的浸泡实验,结果表明:690TT合金氧化膜由NiO、NiFe2 O4和NiCr2 O4构成。合金的氧化膜分层,靠近基体的腐蚀产物为混杂的富Cr和富Ni氧化物,是沿晶腐蚀和表面均匀腐蚀综合作用所致。中间层主要以NiCr2O4为主,外层是NiFe2O4以及NiO。氧化膜同时具有n型和p型半导体特征,内层富Cr的氧化物为p型半导体,而外层富Fe的氧化物为n型半导体。
Using a static autoclave, immersion test of 690TT alloy for 5 ~ 60 d in 10% NaOH + 10 g / L PbO corrosive medium at 330 ℃ showed that the 690TT alloy oxide film consists of NiO, NiFe2O4 and NiCr2O4 . Alloy oxide film delamination, the corrosion products near the substrate for the mixed Cr-rich and Ni-rich oxide, along the crystal corrosion and surface erosion caused by the combined effect. The middle layer is dominated by NiCr2O4 and the outer layer is NiFe2O4 and NiO. The oxide film has both n-type and p-type semiconductor characteristics, the inner Cr-rich oxide is a p-type semiconductor and the outer Fe-rich oxide is an n-type semiconductor.