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本文采用旋涂和溶胶—凝胶两种手段制备XW1 1 O39n - /SiO2 (X =Si,Ge或P)复合膜。首先通过在XW1 1 O39n - 存在下四乙氧基硅 (TEOS)水解制备XW1 1 O39n- /SiO2 的溶胶 ,而XW1 1 O39n- /SiO2 的形成是由缺位XW1 1 O39n- 阴离子空位上亲核的表面氧原子与氧化硅网络中亲电的表面硅羟基 (≡Si-OH)间的共价键作用 ,其结果是导致XW1 1 O39n - 表面趋向饱和 ;然后 ,通过旋涂法制备了XW1 1 O39n- /SiO2 复合膜 ,本文提出了该复合膜的结构模型 ,并通过紫外—可见光谱 (UV -vis)、红外光谱 (IR)和31 P及2 9Si固体核磁共振波谱等手段证明复合膜中XW1 1 O39n- 的基本骨架结构未发生改变。膜的表面形貌通过扫描电子显微镜 (SEM)进行了表征 ,表明所制备的膜是均匀的 ,膜的厚度在 2 5 0～ 35 0nm之间。通过水溶液中甲酸 (FA)的光催化降解反应证明XW1 1 O39n- /SiO2 具有光催化活性 ,FA的降解反应遵循Langmuir一级动力学。
In this paper, XW1 1 O39n - / SiO2 (X = Si, Ge or P) composite films were prepared by spin coating and sol - gel methods. The sol of XW1 1 O39n- / SiO2 was first prepared by hydrolysis of tetraethoxysilane (TEOS) in the presence of XW1 1 O39n-, whereas the formation of XW1 1 O39n- / SiO2 was due to nucleophilic vacancies on the vacancy XW1 1 O39n- anion Of the surface oxygen atoms and silicon oxide network hydrophilic electrophilic surface silanol (≡ Si-OH) between the covalent bond, the result is led to XW1 1 O39n - surface saturation; and then prepared by spin-coating XW1 1 O39n- / SiO2 composite membrane, the structural model of the composite membrane was proposed in this paper. The UV-Vis, IR and 31 P and 29Si NMR spectra of The basic structure of XW1 1 O39n- has not changed. The surface morphology of the films was characterized by scanning electron microscopy (SEM), indicating that the films prepared were uniform and the film thickness was between 250 and 3500 nm. The photocatalytic activity of XW1 1 O39n- / SiO2 was proved by the photocatalytic degradation of formic acid (FA) in aqueous solution. The degradation of FA followed the Langmuir first-order kinetics.